Este artículo propone un tipo de revestimiento de carga de doble capa fabricado mediante deposición química de vapor (CVD) que tiene tungsteno como revestimiento interior. La viabilidad de este diseño se evaluó mediante pruebas de penetración a partir de revestimientos de carga de doble capa utilizando CVD para depositar capas de tungsteno en las superficies internas de revestimientos de cobre puro.
Abstract
This paper proposes a type of double-layer charge liner fabricated using chemical vapor deposition (CVD) that has tungsten as its inner liner. The feasibility of this design was evaluated through penetration tests. Double-layer charge liners were fabricated by using CVD to deposit tungsten layers on the inner surfaces of pure T2 copper liners. The microstructures of the tungsten layers were analyzed using a scanning electron microscope (SEM). The feasibility analysis was carried out by pulsed X-rays, slug-retrieval test and static penetration tests. The shaped charge jet forming and penetration law of inner tungsten-coated double-layer liner were studied by numerical simulation method. The results showed that the double-layer liners could form well-shaped jets. The errors between the X-ray test results and the numerical results were within 11.07%. A slug-retrieval test was found that the retrieved slug was similar to a numerically simulated slug. Compared with the traditional pure copper shaped charge jet, the penetration depth of the double-layer shaped charge liner increased by 11.4% and >10.8% respectively. In summary, the test results are good, and the numerical simulation is in good agreement with the test, which verified the feasibility of using the CVD method to fabricate double-layer charge liners with a high-density and high-strength refractory metal as the inner liner.
Fuente: https://www.sciencedirect.com
